Product Name: Boron Nitride Crucible
Material: High-Purity Boron Nitride (BN)
Material Characteristics: Excellent thermal shock resistance, non-wetting to molten metals, chemical inertness, high temperature stability
Application Fields: Metal evaporation, semiconductor crystal growth, high-purity melting, laboratory research
Application Industries: Semiconductor, metallurgy, research institutions, precious metal processing
Processing Challenges: Maintaining uniform wall thickness, preventing contamination, achieving smooth inner surface
Processing Flow: Powder preparation → Press forming → High-temperature sintering → Precision machining → Surface polishing → Quality inspection
Delivery Time: 45-60 days for standard crucibles, 65-85 days for customized specifications
Boron Nitride Crucibles are advanced ceramic containers engineered for high-purity melting and crystal growth applications. Manufactured from high-purity boron nitride, these crucibles demonstrate exceptional performance in metal evaporation and semiconductor processing, surpassing traditional quartz and graphite crucibles through their excellent thermal shock resistance and non-wetting characteristics.
Key Features:
Excellent Thermal Shock Resistance - Withstands rapid temperature changes from 1500°C to room temperature without cracking.
Non-wetting Properties - Provides easy release from molten metals, semiconductors, and other materials without contamination.
High Temperature Stability - Operates continuously at temperatures up to 2000°C in inert atmospheres with minimal degradation.
Superior Chemical Inertness - Resists attack from most molten metals, salts, and corrosive materials.
High Purity - Typical purity >99.7% ensures minimal contamination of processed materials.
Precision Machining - Achieves smooth inner surfaces (Ra < 0.4 μm) and uniform wall thickness (±0.1 mm).
